Company History

Incorporated by Industrial Technology Investment Corporation. Chin-Tay Shih appointed the president, and Parkson Chen the director by the Prepraration Committee.

Approved by Hsinchu Science Park for in-park establishment per qualification of Rule #3 of the Science Park Establishment Regulation Code.

Memorandum and Articles of Association passed by the Founding Committee. 9 board members elected, of Morris Chang, Chin-Tay Shih, Ching-Chu Chang, Fan-Cheng Tseng, Hyley H. Huang, Chi-Lin Chiang, Jui-Yu Kuo and Parkson Chen. 3 supervisors appointed, of Min-Chan Chen, Kuo-Ching Wu and Mei-Li Tsai. Chin-Tay Shih named the Chairman, and Parkson Chen the President.

Business license issued.

0.96 acres of land approved by the Hsinchu Science Park for construction of fabrication plant.

Construction of the new fabrication plant at the Hsinchu Science Park officially commenced.

A second electron beam lithography system purchased.

Approved as a publicly traded company by the Securities and Futures Institute.

Fabrication plant at the Hsinchu Science Park inaugurated.

First photomask of 4M DRAM commissioned by the Electronics Research and Service Organization delievered, demonstrating Taiwan's capabilities in sub-micron technologies.

Agreement made to purchase CORE-2564, a laser-beam mask lithography system produced by ETEC from Japan-based ICA, as needed by the IC industry for the development of 16M DRAM and 64M DRAM.

Medal of zero defect awarded by US-based ICS for TMC's record of fast and defect-free deliveries.

First LCD-purposed photomasks co-developed with Industrial Technology Research Institute.

A state-of-the-art laser-beam mask lithography system CORE-2564PSM deployed, enabling production of phase-shift masks with high-speed computing power.

Filings made to publicly trade TMC shares at the Taiwan Stock Exchange on April 17th.

The nation's first photomask for LCD panels produced with the deployment of a large mask lithography system.

JBX-7000MV, a Japan-made e-beam mask writer designed for production of 64M and 256M DRAM, the first shaped e-beam mask writer introduced to the company, advancing our manufacturing process to the next generation.

UMC (United Microelectronics Corporation) agreed to acquire a 0.35μm-process mask writer at TMC's production facility in 1999 to provision masks for UMC's 8-inch wafer fabrication plant.

ALTA-3000, a state-of-the-art laser-beam lithography mask system produced by US-based ETEC, deployed for production of 0.35μm and development of 0.25μm technologies to supply photomasks to 8-inch wafer fabs of our customers.

ISO 9000 quality assurance-certified.

ALTA-3500, a laser-beam mask lithography system produced by US-based ETEC, deployed for production of 0.18μm and development of 0.15μm technologies.

Hsin-Tai Technology Co., Ltd. acquired.

Production plant #2 constructed and inaugurated.

EBM35005, an e-beam mask writer purchased from Japan-based NUFLARE, deployed for production of 0.13μm and development of 0.11μm technologies.

JBX3030/3040, an e-beam mask writer purchased from Japan-based JEOL, deployed for production of 0.11μm and development of 90nm technologies.

ISO-14000 environmental management-certified.

Miracle Technology Co., Ltd. acquired.

JBX3050MVS, an e-beam mask writer purchased from Japan-based JEOL, deployed for production of 65nm and development of 40nm technologies.

Controlling stake of Aptos Technology Inc. acquired through investment subsidiary You-Chuan Holdings Inc. during a reelection of the board of directors.

昱嘉科技(股)公司於 109 年 12 月 16 日召開股東臨時會全面改選董事，本公司之子公司友縳投資(股)公司當選該公司所有董事會席次，取得對該公司之實質控制力，自該日起納入本公司之子公司。 Controlling stake of Innova Vision Inc. acquired through investment subsidary You-Chuan Holdings Inc. druing a reelection of the board of directors on Dec. 16, 2020.

ISO 27000 information security management-certified.

本公司購買日本 JEOL 公司所出產之電子束曝光設備，該機型號為 JBX3200MVS，是專為 40 奈米製程量產及 28奈米製程開發所設計之機型。 JBX3200MVS, an e-beam mask writer purchased from Japan-based JEOL, deployed for production of 40nm and development of 28nm technologies.